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CNF Lab and Equipment Information
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Suss SB8e Substrate Bonder
Universal tool for bonding processes for micro-electro-mechanical systems
Manager: Edward Camacho
Backup: Rob Ilic
Equipment Training
Check the weekly Lithography schedule for training. Description:The Suss SB8e VAC substrate bonder is universal tool for bonding proses for micro-electro-mechanical system applications such as Anodic Bonding, Silicon Fusion Bonding, Adhesive Bonding and Thermal Compression Bonding. After Alignment the substrate stack are either mechanically clamped using the transport fixture or later-welded for further processing in the tool chamber. This tool can sustain wafers up-to 150mm. It can vacuum down to 5x10e-5 mbar with an overpressure up-to3 bar. The bonding process takes place under a controlled environment. The SB8e basic configurations consist of a basic load lock vacuum chamber with pneumatic, machine controls and a PC running the control software on Windows NT. The loading slide to hold the substrate transport fixture for secure a loading process. Inside the process chamber resides the integrated handling system for shift-free transfers of the substrate stack and the motorized Z- axis drive allowing for different bonding sequences. Hot top and bottom chucks are also found inside. Capabilities:Software controllable contact force of elctrode Processes Available:Anodic Bonding (AB) Applications:Microfluidics, pressure sensors, optoelectronics, MEMS, Packaging, and SOI production. Additional Resources:Equipment Information SheetBack to Top |
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PACKAGING & MISC PROCESSING
Chemical Mechanical Polishing CMP - 6EC CorSolutions Microfluidic Probe Station Critical Point Dryer Dicing Saw - KS 7100 Dimatix Printer Hamatech Post CMP Brushcleaner Hot Press Ion Implant - Eaton KS Bonder Microdrill MVD100 PDMS Casting Station Rapid Thermal Processer - AG8108 RTA - AG610 Suss SB8e Substrate Bonder Versalaser Cutting/Engraving Tool Wire Bonder Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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