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Boron Doping - D1

Solid Source Boron Diffusion

Manager: Phil Infante
Backup: Aaron Windsor , Daniel McCollister

Description:

The Boron Doping Furnace is an atmospheric furnace with a 40” flat zone capable of processing up to 6” diameter wafers. The furnace tube is configured for utilizing solid source wafers for silicon doping. The furnace is restricted to silicon materials.

Capabilities:

The Boron Doping Furnace is an atmospheric furnace with a 40” flat zone capable of processing up to 6” diameter wafers. The furnace tube is configured for utilizing solid source wafers for silicon doping. The furnace is restricted to silicon materials.


Additional Resources:

Location of tool in cleanroom (jpg)


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