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CNF Lab and Equipment Information
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YES Vapor Prime Oven
CAC Name: YES Vacuum oven for HMDS wafer priming 
Manager: Garry Bordonaro
Backup: Edward Camacho
Equipment Training
Training is given one-on-one to users on request. Description:The YES LP-III is a vacuum oven that can be used for HMDS vapor priming. Using hexamethyldisilazane (HMDS), the unit functions as a standard vacuum vapor primer. Clean wafers are dehydrated through a series of heated (150C) evacuation and dry N2 (nitrogen) refills. HMDS vapor then evaporates into the evacuated chamber forming a monolayer on the wafer surfaces. Vapor priming is used to improve the adhesion of the photoresist to the wafer. Additional Resources:Equipment Information SheetBack to Top |
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PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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