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CNF Lab and Equipment Information
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YES Vapor Prime Oven


Vacuum oven for HMDS wafer priming

Yield Engineering Systems LP-III Vapor Prime Oven Backup: Edward Camacho , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request. Please contact the tool manager for training.


The YES LP-III is a vacuum oven that can be used for HMDS vapor priming. Using hexamethyldisilazane (HMDS), the unit functions as a standard vacuum vapor primer. Clean wafers are dehydrated through a series of heated (150C) evacuation and dry N2 (nitrogen) refills. HMDS vapor then evaporates into the evacuated chamber forming a monolayer on the wafer surfaces. Vapor priming is used to improve the adhesion of the photoresist to the wafer.


  • HMDS vapor priming for improved adhesion of photoresist

Additional Resources:

Equipment Information Sheet

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Photolithography Training Sessions for the Week of March 19th
Mar 19, 2018
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Tuesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web pages ...more


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