PROLITH by KLA-Tencor
Photolithography Modeling Software
Manager: Garry Bordonaro
Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.
EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.
Swing curve, Bosung curve, 2D resist profile, 3D resist profile, dose to clear, dose to print, OPC, flare, Zernike aberrations.
Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.
Additional Resources:PROLITH by KLA-Tencor
PROLITH by KLA-Tencor Product Page
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This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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