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PROLITH by KLA-Tencor

Photolithography Modeling Software

Manager: Garry Bordonaro

Description:

Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.

Capabilities:

EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.

Processes Available:

Swing curve, Bosung curve, 2D resist profile, 3D resist profile, dose to clear, dose to print, OPC, flare, Zernike aberrations.

Applications:

Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.


Additional Resources:

PROLITH by KLA-Tencor
PROLITH by KLA-Tencor Product Page


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This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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