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CNF Lab and Equipment Information
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YES Asher
CAC Name: yesasher YES CV200RFS Oxygen Plasma Asher
Manager: Jerry Drumheller
Equipment Training
Training takes about a half hour and is set up as needed through e-mail. Please contact Jerry Drumheller (drumheller@cnf.cornell.edu) to set up a mutually convenient time. Description:Vacuum system with Oxygen Plasma, designed for Resist Stripping and Descum. It uses a 9" diameter Hot Plate stage to control wafer temperature. The system is used to strip resist off single wafers, up to 8" diameter. The 40 KHz plasma is isolated from the wafer by a grounded, perforated metal plate. Capabilities:
Processes Available:Oxygen is used for removing organics. Nitrogen and Argon are also available for gentle cleaning and oxide removal. Typical operating pressure is 300-350 mTorr. Applications:Resist Stripping, Patterned Resist Descum, Wafer Cleaning. Additional Resources:Equipment Information SheetBack to Top |
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PlasmaTherm service visits
May 03, 2013 PlasmaTherm will have a service engineer on site to perform service on the etch tools. Here is the schedule when the tools will be unavailable: Week of May 6: PlasmaTherm VLN DRIE - ongoing issue Week of May 13: PT770 Week of May 20: PT770 & PT720/740 Scheduled updated 4/30 due to delays. Please plan accordingly. ![]()
ETCHING
Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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