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CNF Lab and Equipment Information
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Ion Implant - Eaton
CAC Name: Eaton Implanter Ion Implanter 
Manager: Paul Pelletier
Backup: Michael Skvarla
, Rob Ilic
Equipment Training
Training is not offered for the Eaton ion implanter. All implants are performed by designated CNF staff. Contact Chris Alpha or Rob via E-mail with implant requests. Please try to schedule your implant at least week or so days before you need it. Normal operating times are from 8:00am to 4:00pm Monday through Friday. To determine the amount of time needed for implantation, base your implant time on a dose of 1e16/hr plus 1/2hr set up time. Description:The Eaton NV-6200AV is a medium current Ion Implanter capable of implanting dopants at beam energies from 10 to 190 KEV. Currently Arsine, Phosphine, Boron Trifluoride, Carbon Dioxide, Argon and Helium are available for implant. The implanter is configured for 6" wafers but carrier wafers are available for implanting 4" wafers or pieces. Results:
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PACKAGING & MISC PROCESSING
Chemical Mechanical Polishing CMP - 6EC CorSolutions Microfluidic Probe Station Critical Point Dryer Dicing Saw - KS 7100 Dimatix Printer Hamatech Post CMP Brushcleaner Hot Press Ion Implant - Eaton KS Bonder Microdrill MVD100 PDMS Casting Station Rapid Thermal Processer - AG8108 RTA - AG610 Suss SB8e Substrate Bonder Versalaser Cutting/Engraving Tool Wire Bonder Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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