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PACKAGING & MISC PROCESSING
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Rapid Thermal Processer - AG8108
CAC Name: RTP 8108 Rapid Thermal Processer - AG8 
Manager: Christopher Alpha
Backup: Michael Skvarla
Equipment Training
Training lasts approximately 45 minutes. Please contact the tool manager to schedule training.
There are no training sessions currently scheduled.
Description:The RTP 8108 is a rapid thermal processing tool capable of rapid thermal annealing and rapid thermal oxidation of 4" and 6" wafers at temperatures of up to 1150 degrees C. The tool is configured with Oxygen, Argon, Forming Gas (2.8% H2, balance Argon) and Nitrogen. Gas flow ranges are up to 10 SLPM. Applications:The RTP 8108 is a MOS compatible tool. This tool follows all of the same restrictions that pertain to the MOS diffusion furnaces with respect to cleanliness and materials. Additional Resources:Equipment Information SheetBack to Top |
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PACKAGING & MISC PROCESSING
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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