L-Edit Layout Editor software by Tanner EDA

Description:

L-Edit is a layout editor for photolithography, electron beam lithography, or dot-matrix printing. It runs on Windows computers in the CNF CAD room, the cleanroom, and 2nd floor labs.

L-Edit is used to design devices and produce intermediate files in an industry-standard format.

For the dot-matrix printer the intermediate format is CIF, and the copy of L-Edit in the dot-matrix printer lab must be used to export the file to CIF format.

For electron beam lithography and photolithography the intermediate file format is GDSII.

Contact managers of each e beam or mask making tool to learn how to convert from GDSII to the native file format for that tool. The e beam tools are the JEOL 6300FS and the JEOL 9300FS. The mask makers are the Mann 3600 optical pattern generator and the Heidelberg DWL66 laser pattern generator.

Capabilities:

• Large, useful manual available from Help menu
• Boolean and derived layer operations; subtract, grow and shrink on groups of objects
• Design navigator for easy traversal of design hierarchy
• Area calculator (in Tools -> Add-Ins)
• Cross-section viewer to simulate a set of simplified process steps and visualize vertical structure of a device
• Support for parameterized cells called T-Cells
• User-programmable interface (UPI) with C/C++ syntax

Additional Resources: