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CNF Lab and Equipment Information
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Resist Hot Strip Bath
Heated solvent for photoresist stripping 
Manager: Edward Camacho
Backup: Garry Bordonaro
Equipment Training
Training is given one-on-one to users on request. Description:The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks. Additional Resources:Equipment Information SheetBack to Top |
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AUTOSTEP AS200 *UNAVAILABLE* June 3rd-7th
May 24, 2013 The AS200 will be undergo regular maintenance beginning June 3rd and continuing the rest of the week. Any changes to the schedule will be posted here. Please plan accordingly. Garry 
PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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