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CNF Lab and Equipment Information
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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request.


The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.


  • Hot NMP

Additional Resources:

Equipment Information Sheet

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