CNF - Lab and Equipment Information

CNF Lab and Equipment Information

Report Trouble ¦

View Open Trouble ¦

Schedule Training ¦

Resist Hot Strip Bath

Heated solvent for photoresist stripping

Manager: Edward Camacho

Backup: Garry Bordonaro

Equipment Training
Training is given one-on-one to users on request.

Description:

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Additional Resources:

Equipment Information Sheet

Back to Top

Photolithograhy Training Sessions for the Week of June 17th
Jun 18, 2013
General Photolithography training will be held Tuesday at 1:30 PM. Meet in the Spinner Room.

MA6 Mask Aligner training session will be held
Wednesday at 10:00AM. Meet in the Contact Aligner Room.

ABM Mask Aligner training session will be held
Thursday at 10:00AM. Meet in the Contact Aligner Room.

PG training will be scheduled based on requests.

Please review the materials available at each of the web pages associated with the tools above.

PLEASE BE ON TIME!
__________
Edwar ...more

SPACE AVAILABLE in Microfluidics Course
Jun 18, 2013
The NBTC is offering a 3-day course covering the design, fab, and assembly of microfluidic devices. The course is offered June 26-28. Contact Teresa Porri if interested. Only a few slots left! 254-5200.

Notice Archive

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu