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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla

Description:

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities:

  • Hot NMP




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