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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request.


The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.


  • Hot NMP

Additional Resources:

Equipment Information Sheet

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Photolithography Training Sessions for the Week of March 19th
Mar 19, 2018
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Tuesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web pages ...more


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