CNF - Lab and Equipment Information

CNF Lab and Equipment Information

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GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction

E-beam Pattern Conversion and Proximity Correction

Manager: Rob Ilic

Equipment Training
Please email rob@cnf.cornell.edu for training.

Description:

The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.

Capabilities:

- VisualFLOWTM graphical user interface for drag & drop design of process flows
- Import of layouts in different formats
- Layout Viewer
- Extraction of cells, layers or regions of interest
- Export to different formats
- Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
- E-Beam Proximity Effect Correction
- Output formatter for different E-Beam machines

http://www.genisys-gmbh.de/

Additional Resources:

BEAMERQUICKSTART05-2010v4a.pdf
Beamer Tone Reversal
LayoutBeamer Manual
Training Videos (Flash Required)

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Qualified Operating Systems
Feb 12, 2013
CNF IT has Qualified the following operating systems for use at the facility:

Windows XP and Windows 7
Mac OS X 10.6 - 10.8
RedHat Enterprise Linux v4 and v6
Fedora Linux 15 and Fedora Linux 17
Apple iOS
Android Gingerbread
Android Jellybean

CNF IT has not qualified and does not currently recommend Windows 8 .

Notice Archive

COMPUTING

CATS Pattern Conversion and Proximity Correction Suite
Computer Workstations
Coral
Coral SeaBird
Design Workshop
File Transfer Share for Tools
GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction
Intel Computing Cluster
JGDS2 - Java GDS Library
L-Edit CAD Software
LinkCAD pattern preparation software
Litho Resources
Login IDs
Mobile CNFUsers Site
PROLITH by KLA-Tencor
WhoIAm
WIKI

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu