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GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction

CAC Name: The Computing website has moved to: http://computing.cnfusers.cornell.edu

E-beam Pattern Conversion and Proximity Correction

Backup: David Botsch
Equipment Training
Layout BEAMER training is part of the General Electron Beam Lithography Training. See http://www.cnfusers.cornell.edu/cnf5_tool.taf?_function=detail&eq_id=193

Description:

The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.

Capabilities:

- VisualFLOWTM graphical user interface for drag & drop design of process flows
- Import of layouts in different formats
- Layout Viewer
- Extraction of cells, layers or regions of interest
- Export to different formats
- Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
- E-Beam Proximity Effect Correction
- Output formatter for different E-Beam machines

http://www.genisys-gmbh.de/


Additional Resources:

BEAMERQUICKSTART05-2010v4a.pdf
Beamer Tone Reversal
LayoutBeamer Manual
Training Videos (Flash Required)


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