GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction
E-beam Pattern Conversion and Proximity Correction
Manager: Alan R. BleierBackup: David Botsch
The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.
- VisualFLOWTM graphical user interface for drag & drop design of process flows
Beamer Tone Reversal
Training Videos (Flash Required)
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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