GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction
E-beam Pattern Conversion and Proximity Correction
Manager: Alan R. BleierBackup: David Botsch
The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.
- VisualFLOWTM graphical user interface for drag & drop design of process flows
Beamer Tone Reversal
Training Videos (Flash Required)
Back to Top
This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: email@example.com
Powered by ITX