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CNF Lab and Equipment Information
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Trion Etcher
Cr RIE system Manager: Vince Genova
Backup: Meredith Metzler
Equipment Training
Training is scheduled on an as needed basis. Email your request. Description:Trion Minilock III is an RIE/ICP system who purpose is to etch chrome and eventually glass plates. Capabilities:The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates. Processes Available:Chrome etch processes are presently available on the tool. A glass etch process is being developed. Applications:Additional Resources:Equipment Information SheetBack to Top |
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PlasmaTherm service visits
May 03, 2013 PlasmaTherm will have a service engineer on site to perform service on the etch tools. Here is the schedule when the tools will be unavailable: Week of May 6: PlasmaTherm VLN DRIE - ongoing issue Week of May 13: PT770 Week of May 20: PT770 & PT720/740 Scheduled updated 4/30 due to delays. Please plan accordingly. 
ETCHING
Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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