CNF Lab and Equipment Information
Cr ICP system
Manager: Jeremy ClarkBackup: Tom Pennell , Vince Genova
Trion Minilock III is an RIE/ICP system who purpose is to etch Chrome.
The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.
Chrome etch processes are presently available on the tool.
Additional Resources:Equipment Information Sheet
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Acid Etching Tanks
AJA Ion Mill
Anatech Resist Strip
Aura 1000 Resist Strip
Branson Resist Strip
Glen 1000 Resist Strip
Hamatech Hot Piranha
Hamatech Hot SC1/SC2
Oxford 100 Etcher
Oxford 81 Etcher
Oxford 82 Etcher
Oxford Cobra ICP Etcher
PlasmaTherm Deep Si Etcher
Primaxx Vapor HF Etcher
Unaxis 770 Deep Si Etcher
Xactix Xenon Difluoride Etcher
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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