Cr RIE system
Manager: Vince GenovaBackup: Meredith Metzler
Trion Minilock III is an RIE/ICP system who purpose is to etch chrome and eventually glass plates.
The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.
Chrome etch processes are presently available on the tool. A glass etch process is being developed.
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
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