CNF - Lab and Equipment Information

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Cr RIE system

Manager: Vince Genova

Backup: Meredith Metzler

Description:

Trion Minilock III is an RIE/ICP system who purpose is to etch chrome and eventually glass plates.

Capabilities:

The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.

Processes Available:

Chrome etch processes are presently available on the tool. A glass etch process is being developed.

Applications:

Cornell University

NYSTAR

NNIN

NSF

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu