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Spin Rinse Dryers

Tools for drying wafers after wet chemistry

Spin Rinse Dryer
Manager: Sam Wright
Backup: Phil Infante
Equipment Training
Training is not necessary for these tools but is included as part of the general photolithography training. Please contact the tool manager if you have any questions.


Spin Rinse Dryers are available at most chemical hoods. Sample sizes are 4" wafers and 4", 5", or 6" masks, depending on the SRD.

Additional Resources:

Equipment Information Sheet

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