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Manual Resist Spinners

Resist Spinners

Manual Resist Spinners
Manager: Edward Camacho
Backup: Garry Bordonaro
Equipment Training
Training is usually offered weekly, and often at a time convenient to the needs of the new users for the week. Please contact the tool manager for the training schedule.

Description:

The CNF has a variety of generic manual resist spinners in both the Photolithography and E-Beam Lithography rooms. Training is held regularly.


Additional Resources:

Equipment Information Sheet


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Notice Archive

EQUIPMENT LIST
PHOTOLITHOGRAPHY

5X g-line Stepper
ABM Contact Aligner
ASML 300C DUV Stepper
Autostep i-line Stepper
EV620 Contact Aligner
Fusion UV Cure
Gamma Automatic Coat-Develop Tool
Hamatech-Steag Mask Processors
Hamatech-Steag Wafer Processors
Heidelberg Mask Writer DWL2000
JBA 1000 Photoresist UV Cure
Karl Suss RC-8
Manual Resist Spinners
Nanoimprint NX-2500
PG Mask Writer
Resist Hot Strip Bath
SU-8 Hotplates
Suss MA6-BA6 Contact Aligner
YES Image Reversal Oven
YES Polymide Bake Oven
YES Vapor Prime Oven

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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