Optical mask-making tool

Description:

The 3600F is a laser interferometer metered pattern generator for the generation of patterns on Chrome mask blanks. A vacuum plateholder accommodates 2-inch through 7-inch plates with a standard mask thickness of 0.090 inch. The range of feature sizes is 2 µm to 1.5 mm in 0.5 µm increments and aperture rotation is from 0 through 89.9 degrees in 0.1 degree increments. With a 0.1 µm grid data input, positional accuracy of exposed images is 0.6 µm in each coordinate over the full 150 mm of stage motion. When used with the 5X or 10X GCA stepper, this instrument is almost always sufficient for mask making. In some cases, more critical masks (for small dimensions contact prints, for example, or for application requiring very smooth curves) are referred to the Heidelberg DWL66 Laser Writer or the electron beam lithography systems.

Capabilities:

• Mask exposure tool using fractured pattern data as input
• Laser-controlled stage motion for accurate image placement
• Variable width apertures from 2 µm to 1.5 mm
• Aperture rotation from 0-89.9 degrees in 0.1 degree increments
• Mask sizes from 2
• Mask Writing Rate: > 3,000 exposures/hour