CNF - Lab and Equipment Information

CNF Lab and Equipment Information

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Suss MA6-BA6 Contact Aligner

CAC Name: MA6/BA6

Karl Suss MA/BA 6 Contact Aligner

Manager: Edward Camacho

Backup: Garry Bordonaro , Rob Ilic

Equipment Training
Training is usually offered weekly, and often at a time convenient to the needs of the new users for the week. Please contact the tool manager for the training schedule.

Description:

This contact aligner uses 280-350 nm light to expose wafers up to 150mm diameter. The system features an infrared camera for alignment to patterns on the backside of the wafer. The versitile mask holder allows both round and square plates as masks, and the sample plate accomodates small and odd-shaped substrates.

Capabilities:

Contact lithography system
Backside infrared alignment
Flood field exposure
Overlay accuracy to 1 um
Substrate size up to 150mm

Additional Resources:

Equipment Information Sheet
Contact Lithography Alignment Keys
Contact Aligner Resist Matrix

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu