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Suss MA6-BA6 Contact Aligner

CAC Name: MA6/BA6

Karl Suss MA/BA 6 Contact Aligner

Karl Suss MA/BA 6 Contact Aligner Backup: Garry Bordonaro , Rob Ilic
Equipment Training
Training is usually offered weekly, and often at a time convenient to the needs of the new users for the week. Please contact the tool manager for the training schedule.

Description:

This contact aligner uses 280-350 nm light to expose wafers up to 150mm diameter. The system features an infrared camera for alignment to patterns on the backside of the wafer. The versitile mask holder allows both round and square plates as masks, and the sample plate accomodates small and odd-shaped substrates.

Capabilities:

  • Contact lithography system
  • Backside infrared alignment
  • Flood field exposure
  • Overlay accuracy to 1 um
  • Substrate size up to 150mm


Additional Resources:

Equipment Information Sheet
Contact Lithography Alignment Keys
Contact Aligner Resist Matrix


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Photolithograhy Training Sessions for the Week of June 17th
Jun 18, 2013
General Photolithography training will be held Tuesday at 1:30 PM. Meet in the Spinner Room.

MA6 Mask Aligner training session will be held
Wednesday at 10:00AM. Meet in the Contact Aligner Room.

ABM Mask Aligner training session will be held
Thursday at 10:00AM. Meet in the Contact Aligner Room.

PG training will be scheduled based on requests.

Please review the materials available at each of the web pages associated with the tools above.


PLEASE BE ON TIME!
__________
Edwar ...more
SPACE AVAILABLE in Microfluidics Course
Jun 18, 2013
The NBTC is offering a 3-day course covering the design, fab, and assembly of microfluidic devices. The course is offered June 26-28. Contact Teresa Porri if interested. Only a few slots left! 254-5200.

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