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CNF Lab and Equipment Information
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Acid Etching Tanks

Tanks for hot Phosphoric acid and Nanostrip etching of wafers

Nanostrip Tank
Manager: Phil Infante
Equipment Training
Hot Phosphoric Tank - Training is by small group classes scheduled as required and takes about 30 minutes. Nanostrip - No training beyond the normal chemical orientation is required. Simply follow the directions at the tank.
There are no training sessions currently scheduled.

Description:

A wet deck with various acid etching tanks and two spray dump rinsers is available for processing wafers. All tanks are recirculated with filtration to provide clean wafer processing. The tanks are sized to handle up to a 150 mm wafer boat. The following chemistries are present in the wet deck:

Hot Phosphoric Acid - Boiling phosphoric acid is used for etching silicon nitride selectively to silicon oxide. The tank is specifically designed for nitride etching with a controller that can maintain the phosphoric acid boiling point to within 0.5°C. This setup is for electronic grade substrates only.

Nanostrip - Nanostrip is a more stable version of the commonly known pirhana etch (Sulfuric Acid / Hydrogen Peroxide) and is used to remove residual organics.


Additional Resources:

Equipment Information Sheet


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PlasmaTherm service visits
May 03, 2013
PlasmaTherm will have a service engineer on site to perform service on the etch tools. Here is the schedule when the tools will be unavailable:

Week of May 6: PlasmaTherm VLN DRIE - ongoing issue
Week of May 13: PT770
Week of May 20: PT770 & PT720/740

Scheduled updated 4/30 due to delays.

Please plan accordingly.
Notice Archive

EQUIPMENT LIST
ETCHING

Acid Etching Tanks
Aura 1000 Resist Strip
Branson Resist Strip
Glen 1000 Resist Strip
Hamatech Hot Piranha
Hamatech Hot SC1/SC2
Oxford 100 Etcher
Oxford 81 Etcher
Oxford 82 Etcher
PlasmaTherm Deep Si Etcher
Primaxx Vapor HF Etcher
PT72 Etcher
PT720-740 Etcher
PT770 Etcher
Trion Etcher
Unaxis 770 Deep Si Etcher
Veeco Ion Mill
Xactix Xenon Difluoride Etcher
YES Asher

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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