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Acid Etching Tanks
Tanks for hot Phosphoric acid and Nanostrip etching of wafers ![]() Manager: Phil Infante
Backup: Christopher Alpha
Description:A wet deck with various acid etching tanks and two spray dump rinsers is available for processing wafers. All tanks are recirculated with filtration to provide clean wafer processing. The tanks are sized to handle up to a 150 mm wafer boat. The following chemistries are present in the wet deck: Capabilities:
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![]() This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |