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CNF Lab and Equipment Information
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E-Beam Lithography Resist Spinners

Manual Resist Spinners for coating substrates with electron beam resist.

Backup: Amrita Banerjee , Alan R. Bleier
Equipment Training
Training is scheduled by need, please email requests for training to the tool manager.
There are no training sessions currently scheduled.


Two manual spinners are provided for spin coating substrates with electron beam resists. Substrates up to 150 mm diameter can be coated.


  • Wafers up to 150mm
  • Pieces greater than 5mm

Additional Resources:

Equipment Information Sheet
Electron Beam Resist Spin Curves
Additional Spin Curves

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