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E-Beam Lithography Resist Spinners

Manual Resist Spinners for coating substrates with electron beam resist.

Backup: Amrita Banerjee , Alan R. Bleier
Equipment Training
Training is scheduled by need, please email requests for training to the tool manager.
There are no training sessions currently scheduled.

Description:

Two manual spinners are provided for spin coating substrates with electron beam resists. Substrates up to 150 mm diameter can be coated.

Capabilities:

  • Wafers up to 150mm
  • Pieces greater than 5mm


Additional Resources:

Equipment Information Sheet
Electron Beam Resist Spin Curves
Additional Spin Curves


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