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Hamatech Post CMP Brushcleaner

Wafer processor for cleaning wafers after CMP

Hamatech Post CMP Cleaner Backup: Rob Ilic

Description:

A Hamatech wafer processer has been converted for use as a post CMP brushcleaner. The tool uses a soft PVA sponge 'brush' to remove slurry particles from the wafer surface after polishing. Dilute ammonium hydroxide is added to improve the slurry particle removal. The wafers are then rinsed and spun dry.


Additional Resources:

Operating Instructions


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