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CNF Lab and Equipment Information
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Hamatech Hot Piranha
Automatic Wafer Processor for SC-1 & Piranha cleans 
Manager: Edward Camacho
Backup: Garry Bordonaro
Description:The Hamatech wafer processor is capable of doing a hot piranha (Sulfuric Acid and Hydrogen Peroxide) clean on photomasks (4, 5, & 7 inch) and wafers (3, 4, and 6 inch). It is also capable of performing ammonium hydroxide brush cleans of substrates. Additional Resources:Equipment Information SheetBack to Top |
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Oxford 100 unavailable 6/17-6/21
Jun 14, 2013 Oxford process support will be here from 6/17-6/21 and the tool will not be available during this time. 
ETCHING
Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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