Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


HTG Contact Aligner

Flexible Contact Aligner with DUV light source

HTG Contact Aligner
Manager: Michael Skvarla
Backup: Garry Bordonaro

Description:

Hybrid Technology Group's (HTG) system III-HR contact/proximity mask aligner is a very versatile instrument with interchangeable light sources which allow UV (365-405 nm) as well as deep-UV (DUV) (220-310 nm) exposures in proximity (non-contact) or contact (soft & hard) modes. The "type IV" mask alignment tooling system accommodates masks up to 5-inch square and chips/wafers up to 100mm diameter. The type IV tooling system also features an air-bearing substrate-to-mask planarization system for wedge-error compensation. The printing resolution is <0.8 µm for near-UV, <0.4 µm for mid-UV and deep-UV in the hard vacuum contact mode. Exposures in the ultra-violet require quartz masks.

Capabilities:

  • Contact lithography system with proximity and hard-contact options
  • Selectable exposure wavelength from 405 nm to 220 nm
  • Substrate size up to 100mm


Additional Resources:

Contact Alignment Keys
Contact Aligner Resist Matrix


Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNINNSF

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
Powered by ITX