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CNF Lab and Equipment Information
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Click the tool name for detailed information.
THIN FILM DEPOSITION
ALD - Oxford FlexAL
Atomic Layer Deposition
CHA Evaporator (CHA)
3 Hearth Thermal Evaporator for Metal Films
CVC Sputter Deposition (CVC)
Magnetron Sputter system for depositing thin metal & dielectric films
Electroplating Tanks (Elec Plate)
Equipment for electroplating various metals
GSI PECVD (GSI)
GSI Plasma Enhanced Chemical Vapor Deposition System
IPE PECVD (PECVD)
IPE 1000 Plasma Enhanced Chemical Vapor Deposition System
Parylene Deposition (Parylene)
Tool for depositing conformal parylene films (Rm 228)
ReynoldsTech Conductive Polymer Vapor Deposition Tool (ReynoldsTech Conductive Polymer Vapor Deposition Tool - Rm 224)
Cluster tool for vapor-deposition of PEDOT or similar polymers
SC4500 Even-Hour Evaporator (SC4500 Even)
CVC SC4500 E-gun Evaporation System for deposition of thin films
SC4500 Odd-Hour Evaporator (SC4500 Odd)
CVC SC4500 Combination Thermal/ E-gun Evaporation System for deposition of thin films
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THIN FILM DEPOSITION
ALD - Oxford FlexAL CHA Evaporator CVC Sputter Deposition Electroplating Tanks GSI PECVD IPE PECVD Parylene Deposition ReynoldsTech Conductive Polymer Vapor Deposition Tool SC4500 Even-Hour Evaporator SC4500 Odd-Hour Evaporator Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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