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CNF Lab and Equipment Information
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Click the tool name for detailed information.
PHOTOLITHOGRAPHY
5X g-line Stepper (5X)
GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper
ABM Contact Aligner (ABM)
Flexible 200mm Mask Aligner with DUV light source
Autostep i-line Stepper (Autostep)
GCA Autostep 200 DSW i-line Wafer Stepper
Brewer Automatic Resist Coat (CEE 6000)
Automatic Wafer Coating and Developing System
EV620 Contact Aligner (EV620)
Contact Lithography Exposure Tool
Hamatech-Steag Mask Processors
Automated Tools for Processing Photomasks
Hamatech-Steag Wafer Processors
Automated Tools for Developing Wafers
Heidelberg Mask Writer (DWL 66)
DWL66 Laser Pattern Generator and Direct Writer
HTG Contact Aligner (HTG)
Flexible Contact Aligner with DUV light source
JBA 1000 Photoresist UV Cure
Tool for UV Curing of photoresist
Karl Suss RC-8 (RC-8)
SussTec GYRSET wafer spin tool
Manual Resist Spinners
Resist Spinners
Nanoimprint NX-2500 (NX2500)
Nanoimprint Lithography
PG Mask Writer (PG3600)
Optical mask-making tool
Resist Hot Strip Bath
Heated solvent for photoresist stripping
YES Image Reversal Oven (YES NH3)
Photoresist image reversal oven
YES Polymide Bake Oven (YES_POLY)
Oven for curing polyimide and other polymer films
YES Vapor Prime Oven (YES)
Vacuum oven for HMDS wafer priming
Additional Resources:Nanocourse 2004 Photolithography Course NotesCNF Photolithography Resist Matrix Contact Lithography Alignment Mark Information Back to Top |
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PG Mask Writer Training
Nov 23, 2009 General Pattern Generator training will be Wednesday the 25th at 2pm. Edward Camacho PG Mask Writer
Photolith Training Sessions Week of November 23rd
Nov 23, 2009 This week's General Photolithography training session will meet in the resist spinner room Tuesday, November 24th, at 1:30 PM. This week's Pattern Generator training session will meet at the tool Wednesday, November 25th, at 2:00 PM (See other notice.) No pre-registration is necessary. 
PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner Autostep i-line Stepper Brewer Automatic Resist Coat EV620 Contact Aligner Fusion UV Cure Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer HTG Contact Aligner JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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