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CNF Lab and Equipment Information
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Click the tool name for detailed information.
PHOTOLITHOGRAPHY
5X g-line Stepper (5X)
GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper
ABM Contact Aligner (ABM)
Flexible 200mm Mask Aligner with DUV light source
ASML 300C DUV Stepper (ASML)
ASML PAS 5500/300C DUV Stepper
Autostep i-line Stepper (Autostep)
GCA Autostep 200 DSW i-line Wafer Stepper
EV620 Contact Aligner (EV620)
Contact Lithography Exposure Tool
Fusion UV Cure (Fusion DUV)
Gamma Automatic Coat-Develop Tool (Gamma)
Suss MicroTec Gamma Cluster Tool
Hamatech-Steag Mask Processors
Automated Tools for Processing Photomasks
Hamatech-Steag Wafer Processors
Automated Tools for Developing Wafers
Heidelberg Mask Writer DWL2000 (DWL 2000)
DWL2000 Laser Pattern Generator and Direct Writer
JBA 1000 Photoresist UV Cure
Tool for UV Curing of photoresist
Karl Suss RC-8 (RC-8)
SussTec GYRSET wafer spin tool
Manual Resist Spinners
Resist Spinners
Nanoimprint NX-2500 (NX2500)
Nanoimprint Lithography
PG Mask Writer (PG3600)
Optical mask-making tool
Resist Hot Strip Bath
Heated solvent for photoresist stripping
SU-8 Hotplates (SU-8 hotplates 1-4)
Hotplates for baking SU-8-coated wafers
Suss MA6-BA6 Contact Aligner (MA6/BA6)
Karl Suss MA/BA 6 Contact Aligner
YES Image Reversal Oven (YES NH3)
Photoresist image reversal oven
YES Polymide Bake Oven (YES POLY)
Oven for curing polyimide and other polymer films
YES Vapor Prime Oven (YES)
Vacuum oven for HMDS wafer priming
Additional Resources:Nanocourse 2004 Photolithography Course NotesCNF Photolithography Resist Matrix Contact Lithography Alignment Mark Information Back to Top |
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Photolithograhy Training Sessions for the Week of June 17th
Jun 18, 2013 General Photolithography training will be held Tuesday at 1:30 PM. Meet in the Spinner Room. MA6 Mask Aligner training session will be held Wednesday at 10:00AM. Meet in the Contact Aligner Room. ABM Mask Aligner training session will be held Thursday at 10:00AM. Meet in the Contact Aligner Room. PG training will be scheduled based on requests. Please review the materials available at each of the web pages associated with the tools above. PLEASE BE ON TIME! __________ Edwar ...more
SPACE AVAILABLE in Microfluidics Course
Jun 18, 2013 The NBTC is offering a 3-day course covering the design, fab, and assembly of microfluidic devices. The course is offered June 26-28. Contact Teresa Porri if interested. Only a few slots left! 254-5200. 
PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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