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CNF Lab and Equipment Information


Click the tool name for detailed information.
PHOTOLITHOGRAPHY
5X g-line Stepper (5X)
GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper
ABM Contact Aligner (ABM)
Flexible 200mm Mask Aligner with DUV light source
ASML 300C DUV Stepper (ASML)
ASML PAS 5500/300C DUV Stepper
Autostep i-line Stepper (Autostep)
GCA Autostep 200 DSW i-line Wafer Stepper
EV620 Contact Aligner (EV620)
Contact Lithography Exposure Tool
Fusion UV Cure (Fusion DUV)
Gamma Automatic Coat-Develop Tool (Gamma)
Suss MicroTec Gamma Cluster Tool
Hamatech-Steag Mask Processors 
Automated Tools for Processing Photomasks
Hamatech-Steag Wafer Processors 
Automated Tools for Developing Wafers
Heidelberg Mask Writer DWL2000 (DWL 2000)
DWL2000 Laser Pattern Generator and Direct Writer
JBA 1000 Photoresist UV Cure 
Tool for UV Curing of photoresist
Karl Suss RC-8 (RC-8)
SussTec GYRSET wafer spin tool
Manual Resist Spinners 
Resist Spinners
Nanoimprint NX-2500 (NX2500)
Nanoimprint Lithography
PG Mask Writer (PG3600)
Optical mask-making tool
Resist Hot Strip Bath 
Heated solvent for photoresist stripping
SU-8 Hotplates (SU-8 hotplates 1-4)
Hotplates for baking SU-8-coated wafers
Suss MA6-BA6 Contact Aligner (MA6/BA6)
Karl Suss MA/BA 6 Contact Aligner
YES Image Reversal Oven (YES NH3)
Photoresist image reversal oven
YES Polymide Bake Oven (YES POLY)
Oven for curing polyimide and other polymer films
YES Vapor Prime Oven (YES)
Vacuum oven for HMDS wafer priming


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Notice Archive

EQUIPMENT LIST
PHOTOLITHOGRAPHY

5X g-line Stepper
ABM Contact Aligner
ASML 300C DUV Stepper
Autostep i-line Stepper
EV620 Contact Aligner
Fusion UV Cure
Gamma Automatic Coat-Develop Tool
Hamatech-Steag Mask Processors
Hamatech-Steag Wafer Processors
Heidelberg Mask Writer DWL2000
JBA 1000 Photoresist UV Cure
Karl Suss RC-8
Manual Resist Spinners
Nanoimprint NX-2500
PG Mask Writer
Resist Hot Strip Bath
SU-8 Hotplates
Suss MA6-BA6 Contact Aligner
YES Image Reversal Oven
YES Polymide Bake Oven
YES Vapor Prime Oven

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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