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Click the tool name for detailed information.
PHOTOLITHOGRAPHY
5X g-line Stepper 
GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper
ABM Contact Aligner 
Flexible 200mm Mask Aligner with DUV light source
Autostep i-line Stepper 
GCA Autostep 200 DSW i-line Wafer Stepper
Brewer Automatic Resist Coat 
Automatic Wafer Coating and Developing System
EV620 Contact Aligner 
Contact Lithography Exposure Tool
Hamatech-Steag Mask Processors 
Automated Tools for Processing Photomasks
Hamatech-Steag Wafer Processors 
Automated Tools for Developing Wafers
Heidelberg Mask Writer 
DWL66 Laser Pattern Generator and Direct Writer
HTG Contact Aligner 
Flexible Contact Aligner with DUV light source
JBA 1000 Photoresist UV Cure 
Tool for UV Curing of photoresist
Karl Suss RC-8 
SussTec GYRSET wafer spin tool
Manual Resist Spinners 
Resist Spinners
Nanoimprint NX-2500 
Nanoimprint Lithography
PG Mask Writer 
Optical mask-making tool
Resist Hot Strip Bath 
Heated solvent for photoresist stripping
YES Image Reversal Oven 
Photoresist image reversal oven
YES Polymide Bake Oven 
Oven for curing polyimide and other polymer films
YES Vapor Prime Oven 
Vacuum oven for HMDS wafer priming


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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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