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Click the tool name for detailed information.
PHOTOLITHOGRAPHY
5X g-line Stepper
GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper
ABM Contact Aligner
Flexible 200mm Mask Aligner with DUV light source
ASML 300C DUV Stepper
ASML PAS 5500/300C DUV Stepper
Autostep i-line Stepper
GCA Autostep 200 DSW i-line Wafer Stepper
EV620 Contact Aligner
Contact Lithography Exposure Tool
Gamma Automatic Coat-Develop Tool
Suss MicroTec Gamma Cluster Tool
Hamatech-Steag Mask Processors
Automated Tools for Processing Photomasks
Hamatech-Steag Wafer Processors
Automated Tools for Developing Wafers
Heidelberg Mask Writer DWL2000
DWL2000 Laser Pattern Generator and Direct Writer
JBA 1000 Photoresist UV Cure
Tool for UV Curing of photoresist
Karl Suss RC-8
SussTec GYRSET wafer spin tool
Manual Resist Spinners
Resist Spinners
Nanoimprint NX-2500
Nanoimprint Lithography
PG Mask Writer
Optical mask-making tool
Resist Hot Strip Bath
Heated solvent for photoresist stripping
SU-8 Hotplates
Hotplates for baking SU-8-coated wafers
Suss MA6-BA6 Contact Aligner
Karl Suss MA/BA 6 Contact Aligner
YES Image Reversal Oven
Photoresist image reversal oven
YES Polymide Bake Oven
Oven for curing polyimide and other polymer films
YES Vapor Prime Oven
Vacuum oven for HMDS wafer priming
Additional Resources:Nanocourse 2004 Photolithography Course NotesCNF Photolithography Resist Matrix Contact Lithography Alignment Mark Information Back to Top |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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