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CNF Lab and Equipment Information
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Click the tool name for detailed information.
ETCHING
Acid Etching Tanks
Tanks for hot Phosphoric acid and Nanostrip etching of wafers
Aura 1000 Resist Strip (AURA1000)
Gasonics downstream asher for dry stripping of photoresist
Branson Resist Strip (BRANSON)
Oxygen plasma barrel asher for Photoresist/organic removal
Glen 1000 Resist Strip (GLEN1000)
Oxygen Plasma tool for removal of organics
Hamatech Hot Piranha
Automatic Wafer Processor for SC-1 & Piranha cleans
Hamatech Hot SC1/SC2
Automatic Single Wafer Processor for SC-1 & SC-2 cleans
Oxford 100 Etcher (Oxford 100)
Oxford PlasmaLab 100 RIE System for fluorine based ICP deep SiO2/glass etching
Oxford 81 Etcher (Oxford 81)
Oxford PlasmaLab 80+ RIE System for fluorine based etching of oxide, nitride, & silicon
Oxford 82 Etcher (Oxford 82)
Oxford PlasmaLab 80+ RIE System for fluorine based etching of oxide, nitride, & silicon with endpoint detection
PlasmaTherm Deep Si Etcher
DRIE silicon etch
Primaxx Vapor HF Etcher (Primaxx)
Vapor HF Isotropic Release Etching
PT72 Etcher (PT 72)
PlasmaTherm 72 Fluorine based Reactive Ion Etcher
PT720-740 Etcher (PT720R740L)
PlasmaTherm720/740 Chlorine-based RIE system for Silicon & Aluminum etching
PT770 Etcher (PT 770)
PlasmaTherm 770 two chamber inductively coupled plasma etching system for plasma etching using Chlorine or Fluorine
Trion Etcher
Cr RIE system
Unaxis 770 Deep Si Etcher (UN 770)
Bosch Etcher for deep silicon etching
Veeco Ion Mill (VEECO)
Ion milling system for physical sputter etching of substrates
Xactix Xenon Difluoride Etcher (XeF2)
Xactix XeF2 Isotropic silicon etch system
YES Asher (yesasher)
YES CV200RFS Oxygen Plasma Asher
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Oxford 100 unavailable 6/17-6/21
Jun 14, 2013 Oxford process support will be here from 6/17-6/21 and the tool will not be available during this time. 
ETCHING
Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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