Tanks for hot Phosphoric acid and Nanostrip etching of wafers

Anatech Plasma Asher

Gasonics downstream asher for dry stripping of photoresist

Oxygen plasma barrel asher for Photoresist/organic removal

Oxygen Plasma tool for removal of organics

Automatic Wafer Processor for SC-1 & Piranha cleans

Automatic Single Wafer Processor for SC-1 & SC-2 cleans

A heated bath of Potassium Hydroxide (KOH)

Oxford PlasmaLab 100 RIE System for fluorine based ICP deep SiO2/glass etching

Oxford PlasmaLab 80+ RIE System for fluorine based etching of oxide, nitride, & silicon

with endpoint detection

Oxford Cobra HBr etcher

DRIE silicon etch

Vapor HF Isotropic Release Etching

PlasmaTherm 72 Fluorine based Reactive Ion Etcher

PlasmaTherm720/740 Chlorine-based RIE system for Silicon & Aluminum etching

PlasmaTherm 770 two chamber inductively coupled plasma etching system for plasma etching using Chlorine or Fluorine

Cr ICP system

Bosch Etcher for deep silicon etching

Xactix XeF2 Isotropic silicon etch system

YES CV200RFS Oxygen Plasma Asher