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	CNF Lab and Equipment Information

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ELECTRON-BEAM LITHOGRAPHY

Electron beam Resist Spinners

Manual Resist Spinners for coating substrates with electron beam resist.

JEOL 9300 (JEOL)

JEOL Ebeam Lithography: JBX-9300FS Electron Beam Lithography System

Leica VB6 (VB6)

100 kV High Resolution e-Beam Lithography System

JEOL Scheduling Restrictions
Oct 27, 2009

Starting next Tuesday November 3 2009 at noon, users can only have 12hrs of advanced reservations. If you already have 12hrs or more booked this week, you will not be able to schedule time until you've up some of the time this week. This limitation will most likely be alleviated when the new JEOL 6300 is available for general use in February 2010.

Note: This restriction is in addition to 3hr limitations from 8am-8pm Monday through Friday.

Rob and Daron

EQUIPMENT LIST

ELECTRON-BEAM LITHOGRAPHY

Electron beam Resist Spinners
JEOL 9300
Leica VB6

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Cornell University

NYSTAR

NNIN

NSF

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu