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CNF Lab and Equipment Information
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Click the tool name for detailed information.
ELECTRON-BEAM LITHOGRAPHY
Electron beam Resist Spinners
Manual Resist Spinners for coating substrates with electron beam resist.
JEOL 6300 (JEOL 6300)
JEOL JBX-6300FS 100 kV Electron Beam Lithography System
JEOL 9300 (JEOL 9300)
JEOL JBX-9300FS Electron Beam Lithography System - RETIRED
JEOL 9500 (JEOL 9500)
JEOL JBX9500FS Electron Beam Lithography System - INSTALLATION BEGINS IN JANUARY
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XR-1541 6% negative e beam resist will arrive Thurs. 5/23/13
May 22, 2013 The XR-1541 6% negative e beam resist will arrive Thurs. 5/23/13
Electron Beam Lithography General Training
May 13, 2013 Every Tuesday from 11:30 am to 2:00 pm in 254 Duffield Hall there will be a general introduction to electron beam lithography, which covers both the JEOL 6300 and the JEOL 9500. Before attending this training, please supply the information about your project which is requested under Equipment Training on the JEOL 6300 web page, http://www.cnfusers.cornell.edu/cnf5_tool.taf?_function=detail&eq_id=171 . This session covers tool specifications, radiation safety, pattern conversion software, ...more 
ELECTRON-BEAM LITHOGRAPHY
Electron beam Resist Spinners JEOL 6300 JEOL 9300 JEOL 9500 Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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