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Click the tool name for detailed information.
ELECTRON-BEAM LITHOGRAPHY
Electron beam Resist Spinners
Manual Resist Spinners for coating substrates with electron beam resist.
JEOL 9300
JEOL Ebeam Lithography: JBX-9300FS Electron Beam Lithography System
Leica VB6
100 kV High Resolution e-Beam Lithography System
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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